National Repository of Grey Literature 3 records found  Search took 0.00 seconds. 
Electron beam lithography on non-conductive substrates
Hovádková, Zuzana ; Šamořil, Tomáš (referee) ; Dvořák, Petr (advisor)
The expansion of electron beam lithography has been really fast during last years. It is mostly because its capability to create big structures with a fine resolution. This study focuses on electron beam lithography on non-conductive substrates, exactly on glass. The lithography on glass is mostly used in life sciences. Because of the transparence of the substrate and its non-toxicity it can be used for cell adhesion. In the experimental section there are shown and compared two techniques how to compensate the charge accumulated on the top of the surface.
Electron beam lithography on non-conductive substrates
Hovádková, Zuzana ; Šamořil, Tomáš (referee) ; Dvořák, Petr (advisor)
The expansion of electron beam lithography has been really fast during last years. It is mostly because its capability to create big structures with a fine resolution. This study focuses on electron beam lithography on non-conductive substrates, exactly on glass. The lithography on glass is mostly used in life sciences. Because of the transparence of the substrate and its non-toxicity it can be used for cell adhesion. In the experimental section there are shown and compared two techniques how to compensate the charge accumulated on the top of the surface.
Electrostatic mini SLEEM for surface studies
Romanovský, Vladimír ; El-Gomati, M.
Exploitation of the low-energy electrons is advantageous for several reasons. One of them is their smaller penetration depth into the material, which reveals itself as favourable for the surface analysis. Using the low-energy electrons even causes partial, and in some cases total elimination ofcharging effects at non-conductive or slightly conductive specimens. Slowprimary electrons (PE) cause only reduced radiation damage of specimens.

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